THERMOCHEMICAL NITRIDATION OF MICROPOROUS SILICA FILMS IN AMMONIA

被引：68

作者：

BROW, RK ^{[1
]}

PANTANO, CG ^{[1
]}

机构：

[1] PENN STATE UNIV,DEPT MAT SCI & ENGN,UNIV PK,PA 16801

来源：

关键词：

OXYNITRIDES - SILICON DIOXIDE FILMS - SUBSTRATES;

D O I：

10.1111/j.1151-2916.1987.tb04845.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

(Edited Abstract)

引用

页码：9 / 14

页数：6

共 28 条

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