MEASUREMENT OF MINORITY-CARRIER LIFETIME PROFILES IN SILICON

被引:20
作者
SCHWAB, G [1 ]
BERNT, H [1 ]
REICHL, H [1 ]
机构
[1] FRAUNHOFER GESELL ANGEW FORSCH,INST FEST KORPER TECHNOL,D-8000 MUNCHEN 60,BUNDES REPUBLIK
关键词
D O I
10.1016/0038-1101(77)90055-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:91 / &
相关论文
共 11 条
[1]  
ANDREEVA NM, 1974, SOV PHYS SEMICOND+, V8, P504
[2]  
FRANKL DR, 1967, ELECTRICAL PROPERTIE
[3]  
GRAFF K, 1973, SEMICONDUCTOR SILICO, P170
[4]  
LILE DL, 1975, SOLID ST ELECTRON, V16, P699
[5]  
MURINA VV, 1972, SOV PHYS SEMICOND+, V6, P979
[7]   LIFETIME MEASUREMENTS IN SILICON EPITAXIAL MATERIALS [J].
REICHL, H ;
BERNT, H .
SOLID-STATE ELECTRONICS, 1975, 18 (05) :453-458
[8]   ON SEPARATION OF BULK AND SURFACE COMPONENTS OF LIFETIME USING PULSED MOS CAPACITOR [J].
SCHRODER, DK ;
NATHANSON, HC .
SOLID-STATE ELECTRONICS, 1970, 13 (05) :577-+
[9]  
VANDERPAUW LJ, 1957, PHILIPS RES REP, V12, P364
[10]  
ZECHNALL W, 1974, THESIS RWTH AACHEN