A PERFORMANCE COMPARISON OF VACUUM DEPOSITION MONITORS EMPLOYING ATOMIC-ABSORPTION (AA) AND ELECTRON-IMPACT EMISSION-SPECTROSCOPY (EIES)

被引：11

作者：

GOGOL, CA

REAGAN, SH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.572106

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：252 / 256

页数：5

共 16 条

[1]

[Anonymous], [No title captured]

BEAN, JC ;

SADOWSKI, EA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (02) :137-142

[3]

Behrndt K. H., 1966, PHYS THIN FILMS, V3, P1

[4]

BUYARD GK, 1974, UTHE TECHNOL INT J, V1

[5]

CADE PE, 1971, THESIS U VERMONT

GOGOL, CA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (03) :884-887

[7]

LU C, 1977, J VAC SCI TECHNOL, V14, P103, DOI 10.1116/1.569096

[8]

LU C, 1977, Patent No. 4036167

[9]

LU C, 1975, THESIS SYRACUSE U

LU, CS ;

LEWIS, O .