ELECTRICAL PROPERTIES OF DIELECTRIC THIN-FILMS OF TANTALUM OXIDE QUARTZ SYSTEM PREPARED BY RF REACTIVE SPUTTERING

被引：3

作者：

UMEZAWA, T ^{[1
]}

YAJIMA, S ^{[1
]}

机构：

[1] HOKKAIDO UNIV,RES INST APPL ELECT,SAPPORO,JAPAN

来源：

关键词：

D O I：

10.1016/0040-6090(75)90214-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：43 / 52

页数：10

共 7 条

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[3] Huber F., 1965, MICROELECTRON RELIAB, V4, P283
[4] DETERMINATION OF DENSITY AND DIELECTRIC CONSTANT OF THIN TA2O5 FILMS
KLERER, J
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (09) : 896 - &
[5] MCLEAN DA, 1966, ELECTROCHEM TECHNOL, V4, P523
[6] TANTALUM-FILM TECHNOLOGY
MCLEAN, DA
SCHWARTZ, N
TIDD, ED
[J]. PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1450 - &
[7] Siddall G., 1959, VACUUM, V9, P274