TANTALUM-FILM TECHNOLOGY

被引:79
作者
MCLEAN, DA
SCHWARTZ, N
TIDD, ED
机构
关键词
D O I
10.1109/PROC.1964.3429
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:1450 / &
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共 35 条
  • [1] SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS
    ANDERSON, GS
    MAYER, WN
    WEHNER, GK
    [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) : 2991 - &
  • [2] [Anonymous], 1953, VACUUM, DOI DOI 10.1016/0042-207X(53)90411-4
  • [3] DEPOSITION OF TANTALUM FILMS WITH OPEN-ENDED VACUUM SYSTEM
    BALDE, JW
    DINEEN, JJ
    CHARSCHAN, SS
    [J]. BELL SYSTEM TECHNICAL JOURNAL, 1964, 43 (1P1): : 127 - +
  • [4] TANTALUM PRINTED CAPACITORS
    BERRY, RW
    SLOAN, DJ
    [J]. PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1959, 47 (06): : 1070 - 1075
  • [5] BERRY RW, 1960, 4 P NATL CONV MIL EL, P214
  • [6] BERRY RW, 1964, MAY P EL COMP C, P86
  • [7] CALBICK CJ, 1962, 9 NAT VAC SAVC 3, P81
  • [8] DUMMER GWA, 1963, BRITISH COMMUNICATIO, V10, P434
  • [9] FULLER WD, 1961, NEREM RECORD, V3, P102
  • [10] GAWEHN H, 1962, Z ANGEW PHYSIK, V14, P458