HETEROEPITAXIAL GROWTH AND SUPERSTRUCTURE OF GE ON SI(111)-7X7 AND (100)-2X1 SURFACES

被引：36

作者：

SHOJI, K

HYODO, M

UEBA, H

TATSUYAMA, C

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1983年 / 22卷 / 10期

关键词：

D O I：

10.1143/JJAP.22.1482

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1482 / 1488

页数：7

共 24 条

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