DUAL-MODE MICROWAVE RADIO-FREQUENCY PLASMA DEPOSITION OF DIELECTRIC THIN-FILMS

被引：50

作者：

MARTINU, L ^{[1
]}

KLEMBERGSAPIEHA, JE ^{[1
]}

WERTHEIMER, MR ^{[1
]}

机构：

[1] ECOLE POLYTECH,DEPT ENGN PHYS,MONTREAL H3C 3A7,QUEBEC,CANADA

来源：

关键词：

D O I：

10.1063/1.101566

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2645 / 2647

页数：3

共 14 条

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[9] Mort J., 1986, PLASMA DEPOSITED THI
[10] DIELECTRIC-PROPERTIES OF PLASMA-POLYMERIZED HEXAMETHYLDISILOXANE FILMS .1. COMPLEX PERMITTIVITY
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