INFLUENCE OF SUBSTRATE-TEMPERATURE AND FILM THICKNESS ON THE STRUCTURE OF REACTIVELY EVAPORATED IN2O3 FILMS

被引：73

作者：

MURANAKA, S ^{[1
]}

BANDO, Y ^{[1
]}

TAKADA, T ^{[1
]}

机构：

[1] KYOTO UNIV,INST CHEM RES,UJI,KYOTO 611,JAPAN

来源：

THIN SOLID FILMS | 1987年 / 151卷 / 03期

关键词：

D O I：

10.1016/0040-6090(87)90134-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：355 / 364

页数：10

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