COMPOSITION AND CONDUCTIVITY OF FLUORINE-DOPED CONDUCTING INDIUM OXIDE-FILMS PREPARED BY REACTIVE ION PLATING

被引：43

作者：

AVARITSIOTIS, JN ^{[1
]}

HOWSON, RP ^{[1
]}

机构：

[1] LOUGHBOROUGH UNIV TECHNOL,DEPT PHYS,LOUGHBOROUGH LE11 3TU,LEICESTERSHIRE,ENGLAND

来源：

THIN SOLID FILMS | 1981年 / 77卷 / 04期

关键词：

D O I：

10.1016/0040-6090(81)90329-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：351 / 357

页数：7

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