CVD SILICON STRUCTURES FORMED BY AMORPHOUS AND CRYSTALLINE GROWTH

被引：8

作者：

BEERS, AM

HINTZEN, HTJM

SCHAEKEN, HG

BLOEM, J

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1983年 / 64卷 / 03期

关键词：

D O I：

10.1016/0022-0248(83)90342-1

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：563 / 571

页数：9

共 25 条

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HINTZEN, HTJM ;

BLOEM, J .

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BLOEM, J .

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[3]

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[4]

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[5]

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[6] CHANGE OF ETCH RATE ASSOCIATED WITH AMORPHOUS TO CRYSTALLINE TRANSITION IN CVD LAYERS OF SILICON [J].

BOXALL, BA .

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[7]

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[8]

DELHEZ R, 1981, I PHYS C SER, V60, P277

[9] GROWTH OF POLYCRYSTALLINE SILICON FILMS - GRAIN-SIZE [J].

EMMANUEL, A ;

POLLOCK, HM .

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[10]

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