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BASIC PARAMETER MEASUREMENT AND CHANNEL BROADENING EFFECT IN THE SUBMICROMETER MOSFET
被引:17
作者
:
PENG, KL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
PENG, KL
[
1
]
OH, SY
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
OH, SY
[
1
]
AFROMOWITZ, MA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
AFROMOWITZ, MA
[
1
]
MOLL, JL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
MOLL, JL
[
1
]
机构
:
[1]
UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
来源
:
IEEE ELECTRON DEVICE LETTERS
|
1984年
/ 5卷
/ 11期
关键词
:
D O I
:
10.1109/EDL.1984.25993
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:473 / 475
页数:3
相关论文
共 4 条
[1]
DELAMONEDA FH, 1982, IEEE ELECTRON DEVICE, P10
[2]
PENG KL, 1982, IEEE ELECTRON DEVICE, P360
[3]
EXPERIMENTAL DERIVATION OF THE SOURCE AND DRAIN RESISTANCE OF MOS-TRANSISTORS
SUCIU, PI
论文数:
0
引用数:
0
h-index:
0
SUCIU, PI
JOHNSTON, RL
论文数:
0
引用数:
0
h-index:
0
JOHNSTON, RL
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(09)
: 1846
-
1848
[4]
NEW METHOD TO DETERMINE EFFECTIVE MOSFET CHANNEL LENGTH
TERADA, K
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Labs, Nippon Electric Co.Ltd
TERADA, K
MUTA, H
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Labs, Nippon Electric Co.Ltd
MUTA, H
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1979,
18
(05)
: 953
-
959
←
1
→
共 4 条
[1]
DELAMONEDA FH, 1982, IEEE ELECTRON DEVICE, P10
[2]
PENG KL, 1982, IEEE ELECTRON DEVICE, P360
[3]
EXPERIMENTAL DERIVATION OF THE SOURCE AND DRAIN RESISTANCE OF MOS-TRANSISTORS
SUCIU, PI
论文数:
0
引用数:
0
h-index:
0
SUCIU, PI
JOHNSTON, RL
论文数:
0
引用数:
0
h-index:
0
JOHNSTON, RL
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(09)
: 1846
-
1848
[4]
NEW METHOD TO DETERMINE EFFECTIVE MOSFET CHANNEL LENGTH
TERADA, K
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Labs, Nippon Electric Co.Ltd
TERADA, K
MUTA, H
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Labs, Nippon Electric Co.Ltd
MUTA, H
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1979,
18
(05)
: 953
-
959
←
1
→