EVIDENCE FOR SIH4 FORMATION DURING THE REACTION OF WATER WITH A SILICON SURFACE

被引：9

作者：

LAMPERT, I

FUSSSTETTER, H

JACOB, H

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 07期

关键词：

D O I：

10.1149/1.2108937

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1472 / 1473

页数：2

共 22 条

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[10] INVESTIGATIONS ON HYDROPHILIC AND HYDROPHOBIC SILICON (100) WAFER SURFACES BY X-RAY PHOTOELECTRON AND HIGH-RESOLUTION ELECTRON-ENERGY LOSS-SPECTROSCOPY [J].

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