OBSERVATIONS OF CMFN RADICALS IN REACTIVE ION-BEAM ETCHING

被引：12

作者：

HAYASHI, T

MIYAMURA, M

KOMIYA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 12期

关键词：

D O I：

10.1143/JJAP.21.L755

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L755 / L757

页数：3

共 19 条

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