MEASUREMENT OF PLASMA DISCHARGE CHARACTERISTICS FOR SPUTTERING APPLICATIONS

被引:52
作者
ESER, E [1 ]
OGILVIE, RE [1 ]
TAYLOR, KA [1 ]
机构
[1] CHARLES STARK DRAPER LAB INC,CAMBRIDGE,MA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期
关键词
SPUTTERING;
D O I
10.1116/1.569454
中图分类号
O59 [应用物理学];
学科分类号
摘要
Plasma and characteristics of rf and dc discharges for sputtering were measured by a cylindrical-type electrostatic probe. Space potentional, floating potential, electron temperature, and plasma density were monitored as a function of discharge voltage, substrate bias, and probe position within the chamber. A description of the probe and supporting circuit used to plot the current-voltage characteristic is given. The electrostatic probe was shown to be a useful tool for characterizing sputtering process and with suitable system calibration, can be used to enhance repeatability of the sputtering process.
引用
收藏
页码:199 / 202
页数:4
相关论文
共 10 条