RESISTS FOR MICROLITHOGRAPHY - PRESENT STATUS AND RECENT RESEARCH TRENDS

被引：15

作者：

SUGITA, K

UENO, N

机构：

[1] Chiba University, Department of Speciality Materials, Inage-ku, Chiba, 263, Yayoi-cho

来源：

关键词：

D O I：

10.1016/0079-6700(92)90019-U

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

[No abstract available]

引用

页码：319 / 360

页数：42

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