DEVELOPMENT OF STRESS AND SURFACE TEMPERATURE DURING DEPOSITION OF LITHIUM FLUORIDE FILMS

被引：26

作者：

BLACKBURN, H

CAMPBELL, DS

机构：

来源：

关键词：

D O I：

10.1080/14786436308213839

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：823 / +

页数：1

共 23 条

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[4] CAMPBELL DS, 1960, 7 T NAT VAC S, P313
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[8] DIELECTRIC THIN FILMS
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[9] THE CAUSE OF STRESS IN EVAPORATED METAL FILMS
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[10] STRESS ANNEALING IN COPPER FILMS
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