CH3 RADICAL DENSITY IN ELECTRON-CYCLOTRON-RESONANCE CH3OH AND CH3OH/H-2 PLASMAS

被引:16
作者
IKEDA, M
AISO, K
HORI, M
GOTO, T
机构
[1] Department of Quantum Engineering, School of Engineering, Nagoya University, Nagoya, 4-64-01, Chikusa-ku
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1995年 / 34卷 / 6A期
关键词
ELECTRON CYCLOTRON RESONANCE PLASMA; INFRARED DIODE LASER ABSORPTION SPECTROSCOPY; CH3OH; CH3 RADICAL DENSITY;
D O I
10.1143/JJAP.34.3273
中图分类号
O59 [应用物理学];
学科分类号
摘要
CH3 radical densities in electron cyclotron resonance (ECR) discharge methanol (CH3OH), methanol diluted with hydrogen gas (CH3OH/H-2) and methane (CH4) plasmas were measured for the first time using infrared diode laser absorption spectroscopy (IRLAS). CH3 radical densities in the CH3OH and CH3OH/H-2 plasmas were estimated to be of the order of 10(11) cm(-3) under the conditions of total pressure of 1.3 Pa and microwave power of 50-800 W. On the other hand, CH3 radical density in the CH4 plasma was estimated to be less than 10(10) cm(-3). Moreover, the production and loss processes of CH3 radical in the CH3OH plasma were discussed on the basis of the results of emission intensity of Ar*, the absorption ratio of CH3OH molecule and the decay curve analysis of CH3 radical after termination of the discharge.
引用
收藏
页码:3273 / 3277
页数:5
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