DEVELOPMENT AND APPLICATIONS OF A COMPACT ELECTRON-CYCLOTRON RESONANCE SOURCE

被引：30

作者：

OKEEFFE, P

KOMURO, S

DEN, S

MORIKAWA, T

AOYAGI, Y

机构：

[1] TOYO UNIV,FAC ENGN,KAWAGOE,SAITAMA 350,JAPAN

[2] IRIE KOKEN CO LTD,KAWAGOE,SAITAMA 356,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 11B期

关键词：

ECR; ECR SOURCE; ECR PLASMA; RADICAL GUN; RADICAL BEAM; OXIDATION; CLEANING; DEPOSITION; ETCHING; PASSIVATION;

D O I：

10.1143/JJAP.30.3164

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new compact ECR plasma source has been developed. The characteristics of this source and it's applications are discussed. Irradiation by oxygen radicals O* for the oxidation during deposition process was found to produce high quality superconducting thin films with increased characteristic temperatures. Hydrogen radical H* beam cleaning of GaAs substrate surfaces was achieved at temperatures as low as 100-degrees-C.

引用

页码：3164 / 3168

页数：5

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