THE EFFECT OF OS ADDITION ON SPUTTERED IRON-OXIDE FILMS

被引：4

作者：

ISHII, O ^{[1
]}

YOSHIMURA, F ^{[1
]}

TERADA, A ^{[1
]}

SATO, I ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, MUSASHINO, TOKYO 180, JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 08期

关键词：

D O I：

10.1063/1.338609

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3825 / 3827

页数：3

相关论文

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