THE EFFECT OF OS ADDITION ON SPUTTERED IRON-OXIDE FILMS

被引:4
作者
ISHII, O [1 ]
YOSHIMURA, F [1 ]
TERADA, A [1 ]
SATO, I [1 ]
机构
[1] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, MUSASHINO, TOKYO 180, JAPAN
关键词
D O I
10.1063/1.338609
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:3825 / 3827
页数:3
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