HIGH-DENSITY RECORDING CHARACTERISTICS OF SPUTTERED GAMMA-FE2O3 THIN-FILM DISKS

被引：49

作者：

YOSHII, S

ISHII, O

HATTORI, S

NAKAGAWA, T

ISHIDA, G

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, MUSASHINO, TOKYO 180, JAPAN

[2] FUJITSU LABS LTD, KAWASAKI, KANAGAWA 211, JAPAN

来源：

关键词：

D O I：

10.1063/1.330907

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2556 / 2560

页数：5

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