GROWTH OF GAAS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION USING THERMALLY DECOMPOSED TRIMETHYLARSENIC

被引：41

作者：

VOOK, DW

REYNOLDS, S

GIBBONS, JF

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 19期

关键词：

D O I：

10.1063/1.97865

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：1386 / 1387

页数：2

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