THIN-FILM PROCESSING OF HIGH-TC SUPERCONDUCTORS

被引：24

作者：

STOESSEL, CH ^{[1
]}

BUNSHAH, RF ^{[1
]}

PRAKASH, S ^{[1
]}

FETTERMAN, HR ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,DEPT ELECT ENGN,LOS ANGELES,CA 90024

来源：

JOURNAL OF SUPERCONDUCTIVITY | 1993年 / 6卷 / 01期

关键词：

SUPERCONDUCTORS; THIN FILMS; THIN-FILM PROCESSING; THIN-FILM DEPOSITION; SPUTTERING; COEVAPORATION; ACTIVATED REACTIVE EVAPORATION; MOLECULAR BEAM EPITAXY; LASER ABLATION; CVD; MO-CVD; PA-CVD; MULTILAYERS; HETEROSTRUCTURES;

D O I：

10.1007/BF00618500

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This review of high-T(c) superconducting thin-film processing focuses on the thin-film deposition technologies since 1987. The common deposition processes are described with reference to their effects on superconductor film performance. A comparative evaluation of the potential of the technologies is also given. The development of multilayers and heterostructures is an important requirement for future device applications and is also described. The latest results of the deposition of novel superconducting materials and deposition on uncommon substrates are discussed. The outlook on some imminent topics of future development in process technologies for high-T(c) superconducting thin films is discussed.

引用

页码：1 / 17

页数：17

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