DEPOSITION AND ANNEALING OF ION-BEAM SPUTTERED Y-BA-CU-O SUPERCONDUCTING FILMS

被引：9

作者：

BERNSTEIN, SD

TUSTISON, RW

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 05期

关键词：

D O I：

10.1063/1.102430

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：501 / 503

页数：3

共 10 条

[1] FILM GROWTH OF HIGH TRANSITION-TEMPERATURE SUPERCONDUCTORS
BROUSSARD, PR
WOLF, SA
[J]. JOURNAL OF CRYSTAL GROWTH, 1988, 91 (03) : 340 - 345
[2] INSITU RESISTANCE OF Y1BA2CU3OX FILMS DURING ANNEAL
DAVIDSON, A
PALEVSKI, A
BRADY, MJ
LAIBOWITZ, RB
KOCH, R
SCHEUERMANN, M
CHI, CC
[J]. APPLIED PHYSICS LETTERS, 1988, 52 (02) : 157 - 159
[3] DOYLE JP, 1989, AIP C P, V182
[4] HIGH-TC Y-BA-CU-O THIN-FILMS BY ION-BEAM SPUTTERING
GAO, J
ZHANG, YZ
ZHAO, BR
OUT, P
YUAN, CW
LI, L
[J]. APPLIED PHYSICS LETTERS, 1988, 53 (26) : 2675 - 2676
[5] TECHNOLOGY OF ION-BEAM SOURCES USED IN SPUTTERING
KAUFMAN, HR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 272 - 276
[6] TEXTURE FORMATION AND ENHANCED CRITICAL CURRENTS IN YBA2CU3O7
MALIK, MK
NAIR, VD
BISWAS, AR
RAGHAVAN, RV
CHADDAH, P
MISHRA, PK
KUMAR, GR
DASANNACHARYA, BA
[J]. APPLIED PHYSICS LETTERS, 1988, 52 (18) : 1525 - 1527
[7] ROTH RS, 1987, ADV CERAM MATER, V2, P303
[8] SPUTTER DEPOSITION OF YBA2CU3O6+X ON ALUMINA AND THE INFLUENCE OF ZRO2 BUFFER LAYERS
STAMPER, A
GREVE, DW
WONG, D
SCHLESINGER, TE
[J]. APPLIED PHYSICS LETTERS, 1988, 52 (20) : 1746 - 1748
[9] SINGLE-CRYSTAL YBA2CU3O7-X THIN-FILMS BY ACTIVATED REACTIVE EVAPORATION
TERASHIMA, T
IIJIMA, K
YAMAMOTO, K
BANDO, Y
MAZAKI, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (01): : L91 - L93
[10] STRESS IN Y2O3 THIN-FILMS DEPOSITED BY RADIO-FREQUENCY MAGNETRON AND ION-BEAM SPUTTERING
TUSTISON, RW
VARITIMOS, TE
MONTANARI, DG
WAHL, JM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 2256 - 2260

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