STRESS IN Y2O3 THIN-FILMS DEPOSITED BY RADIO-FREQUENCY MAGNETRON AND ION-BEAM SPUTTERING

被引:18
作者
TUSTISON, RW
VARITIMOS, TE
MONTANARI, DG
WAHL, JM
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词
D O I
10.1116/1.575924
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
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页码:2256 / 2260
页数:5
相关论文
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