COMPOSITION AND STRESS STATE OF THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING

被引：31

作者：

CASTELLANO, RN

NOTIS, MR

SIMMONS, GW

机构：

[1] BELL TEL LABS INC,ALLENTOWN,PA 18103

[2] LEHIGH UNIV,BETHLEHEM,PA 18015

来源：

关键词：

D O I：

10.1016/0042-207X(77)90040-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：109 / 117

页数：9

共 21 条

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RANDLETT, MR
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WRIGHT, KHR
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[9] STRESS IN FILMS OF SILICON MONOXIDE
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[J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (01): : 13 - &
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