DUOPLASMATRON ION BEAM SOURCE FOR VACUUM SPUTTERING OF THIN FILMS

被引：26

作者：

CHOPRA, KL

RANDLETT, MR

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1967年 / 38卷 / 08期

关键词：

D O I：

10.1063/1.1721039

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：1147 / &

共 28 条

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[3]

BELSER RB, 1953, PHYS REV, V92, P1098

[4] HIGH EFFICIENCY LOW-PRESSURE ION SOURCE [J].

CARLSTON, CE ;

MAGNUSON, GD .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1962, 33 (09) :905-&

[5] GROWTH OF SPUTTERED VS EVAPORATED METAL FILMS [J].

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (09) :3405-&

[6] FACE-CENTERED-CUBIC TUNGSTEN FILMS OBTAINED BY [J].

CHOPRA, KL ;

RANDLETT, MR ;

DUFF, RH .

APPLIED PHYSICS LETTERS, 1966, 9 (11) :402-&

[7]

CHOPRA KL, 1966, APPL PHYS LETTERS, V9, P241

[8]

CHOPRA KL, 1967, PHIL MAG

[9]

COLLIGON JS, 1961, VACUUM, V11, P272

[10]

COOK HC, 1966, NATL VAC S, V13, P93

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