A NOVEL FLOATING-GATE METHOD FOR MEASUREMENT OF ULTRA-LOW HOLE AND ELECTRON GATE CURRENTS IN MOS-TRANSISTORS

被引:33
作者
NISSANCOHEN, Y
机构
关键词
D O I
10.1109/EDL.1986.26474
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:561 / 563
页数:3
相关论文
共 4 条
[1]   HOT-ELECTRON INJECTION INTO THE OXIDE IN N-CHANNEL MOS DEVICES [J].
EITAN, B ;
FROHMANBENTCHKOWSKY, D .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (03) :328-340
[2]   HOT-ELECTRON AND HOLE-EMISSION EFFECTS IN SHORT N-CHANNEL MOSFETS [J].
HOFMANN, KR ;
WERNER, C ;
WEBER, W ;
DORDA, G .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (03) :691-699
[3]  
SAKS NS, UNPUB IEEE T ELECTRO
[4]  
TAKEDA E, 1983, 1983 P INT EL DEV M, P396