QUANTITATIVE XPS - MULTILINE APPROACH

被引:51
作者
HANKE, W
EBEL, H
EBEL, MF
JABLONSKI, A
HIROKAWA, K
机构
[1] VIENNA TECH UNIV,INST ANGEW & TECH PHYS,KARLSPLATZ 13,A-1040 VIENNA,AUSTRIA
[2] POLISH ACAD SCI,INST PHYS CHEM,WARSAW 42,POLAND
[3] TOHOKU UNIV,IRON STEEL & OTHER MET RES INST,SENDAI,MIYAGI 980,JAPAN
关键词
D O I
10.1016/0368-2048(86)80023-8
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
引用
收藏
页码:241 / 257
页数:17
相关论文
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