A MATHEMATICAL-MODEL FOR LPCVD IN A SINGLE WAFER REACTOR

被引：67

作者：

KLEIJN, CR

VANDERMEER, TH

HOOGENDOORN, CJ

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 11期

关键词：

D O I：

10.1149/1.2096465

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3423 / 3433

页数：11

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