ELECTRON TUNNELING THROUGH ASYMMETRIC FILMS OF THERMALLY GROWN AL2O3

被引：146

作者：

POLLACK, SR

MORRIS, CE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1964年 / 35卷 / 05期

关键词：

D O I：

10.1063/1.1713657

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1503 / &

相关论文

共 25 条

[1] ADVANI GT, 1962, P IRE, V50, P1530
[2] IONIC CONDUCTIVITY OF TANTALUM OXIDE AT VERY HIGH FIELDS
BEAN, CP
FISHER, JC
VERMILYEA, DA
[J]. PHYSICAL REVIEW, 1956, 101 (02): : 551 - 554
[3] THEORY OF THE OXIDATION OF METALS
CABRERA, N
MOTT, NF
[J]. REPORTS ON PROGRESS IN PHYSICS, 1948, 12 : 163 - 184
[4] TRANSIENT EFFECTS IN THE IONIC CONDUCTANCE OF ANODIC-OXIDE FILMS AT HIGH FIELDS
DEWALD, JF
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1957, 2 (01) : 55 - 66
[5] ELEY DD, 1959, P ROY SOC LONDON, VA254, P327
[6] TUNNELING THROUGH THIN INSULATING LAYERS
FISHER, JC
GIAEVER, I
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) : 172 - &
[7] FOWLER RH, 1928, P ROY SOC LONDON, VA119, P173
[8] THEORETICAL SHAPE OF METAL-INSULATOR-METAL POTENTIAL BARRIERS
GEPPERT, DV
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (03) : 490 - &
[9] SPACE-CHARGE-LIMITED TUNNEL EMISSION INTO AN INSULATING FILM
GEPPERT, DV
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) : 2993 - &
[10] ELECTRODE EFFECTS ON ALUMINUM OXIDE TUNNEL JUNCTIONS
HANDY, RM
[J]. PHYSICAL REVIEW, 1962, 126 (06): : 1968 - &