DIFFUSION OF NICKEL IN SILICON

被引：27

作者：

BONZEL, HP

机构：

来源：

PHYSICA STATUS SOLIDI | 1967年 / 20卷 / 02期

关键词：

D O I：

10.1002/pssb.19670200210

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：493 / &

共 29 条

[1] THE SOLID SOLUBILITY OF NICKEL IN SILICON DETERMINED BY NEUTRON ACTIVATION ANALYSIS [J].

AALBERTS, JH ;

VERHEIJKE, ML .

APPLIED PHYSICS LETTERS, 1962, 1 (01) :19-20

[2]

Boltaks B.I., 1963, DIFFUSION SEMICONDUC

[3]

BOLTAKS BI, 1964, SOV PHYS-SOL STATE, V6, P600

[4]

BOLTAKS BI, 1964, FIZ TVERD TELA, V6, P771

[5]

BONZEL HP, 1966, BERICH BUNSEN GESELL, V70, P73

[6] GOLD-INDUCED CLIMB OF DISLOCATIONS IN SILICON [J].

DASH, WC .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (12) :2275-2283

[7] MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J].

FRANK, FC ;

TURNBULL, D .

PHYSICAL REVIEW, 1956, 104 (03) :617-618

[8] DIFFUSIVITY AND SOLUBILITY OF COPPER IN GERMANIUM [J].

FULLER, CS ;

STRUTHERS, JD ;

DITZENBERGER, JA ;

WOLFSTIRN, KB .

PHYSICAL REVIEW, 1954, 93 (06) :1182-1189

[9] EFFECT OF STRUCTURAL DEFECTS IN GERMANIUM ON THE DIFFUSION AND ACCEPTOR BEHAVIOR OF COPPER [J].

FULLER, CS ;

DITZENBERGER, JA .

JOURNAL OF APPLIED PHYSICS, 1957, 28 (01) :40-48

[10]

GAUS H, 1965, Z NATURF, VA 20, P1298

← 1 2 3 →