THE INTERSECTING KIKUCHI LINE TECHNIQUE - CRITICAL VOLTAGE AT ANY VOLTAGE

被引:21
作者
TAFTO, J [1 ]
GJONNES, J [1 ]
机构
[1] UNIV OSLO,DEPT PHYS,OSLO 3,NORWAY
关键词
CRYSTALS - Structure - SILICON CARBIDE;
D O I
10.1016/0304-3991(85)90199-8
中图分类号
TH742 [显微镜];
学科分类号
摘要
The close relationship between the critical voltage and the intersecting Kikuchi line technique, two electron diffraction techniques for the accurate determination of structure factor values, is demonstrated by analytical treatment of simple diffraction conditions involving three beams. As an example the value of the 220 structure factor of cubic SiC is determined from convergent-beam electron diffraction using 100 kev electrons.
引用
收藏
页码:329 / 334
页数:6
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