EFFECT OF LATTICE MISMATCH ON SURFACE-MORPHOLOGY OF (110) THIN-FILMS OF 214-TYPE SUPERCONDUCTORS

被引:7
作者
SATO, H
NAITO, M
KINOSHITA, S
ARIMA, T
TOKURA, Y
机构
[1] TOKAI UNIV,DEPT PHYS,HIRATSUKA,KANAGAWA 25912,JAPAN
[2] UNIV TOKYO,DEPT PHYS,BUNKYO KU,TOKYO 113,JAPAN
关键词
D O I
10.1063/1.114074
中图分类号
O59 [应用物理学];
学科分类号
摘要
We characterized the surface morphology of (110) thin films of 214-type superconductors epitaxially grown on substrates of 214-type materials with various degrees of lattice mismatch. By reactive co-evaporation, (110) thin films of La1.85Sr0.15CuO4 and Pr1.85Ce0.15CuO4 are grown on (110) substrates of La2CuO4 and Pr2CuO4. Reflection high energy electron diffraction, scanning electron microscopy, and atomic force microscopy show the roughness of the film surface is reduced by decreasing mismatch. The surface roughness of La1.85Sr0.15CuO4 (110) thin films on La2CuO4 substrates is comparably small to that of (001) films on SrTiO3(001) substrates. © 1995 American Institute of Physics.
引用
收藏
页码:514 / 516
页数:3
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