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ELECTROCHEMICAL BEHAVIOR OF GROWN OXIDE FILMS ON SILICON
被引:12
作者
:
COLLINS, FC
论文数:
0
引用数:
0
h-index:
0
COLLINS, FC
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1965年
/ 112卷
/ 08期
关键词
:
D O I
:
10.1149/1.2423696
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:786 / &
相关论文
共 22 条
[1]
BASSOUS E, PRIVATE COMMUNICATIO
[2]
BRENNEMAN AE, PRIVATE COMMUNICATIO
[3]
DWIGHT HB, 1934, TABLES INTEGRALS OTH, P42
[4]
SOME EFFECTS OF MATERIAL PARAMETERS ON THE DESIGN OF SURFACE SPACE-CHARGE VARACTORS
FRANKL, DR
论文数:
0
引用数:
0
h-index:
0
FRANKL, DR
[J].
SOLID-STATE ELECTRONICS,
1961,
2
(01)
: 71
-
76
[5]
SPACE CHARGE IN GROWING OXIDE FILMS .3. MULTISPECIES DIFFUSION
FROMHOLD, AT
论文数:
0
引用数:
0
h-index:
0
FROMHOLD, AT
[J].
JOURNAL OF CHEMICAL PHYSICS,
1963,
39
(09)
: 2278
-
+
[6]
KINETICS OF OXIDE FILM GROWTH ON METAL CRYSTALS .1. FORMULATION AND NUMERICAL SOLUTIONS
FROMHOLD, AT
论文数:
0
引用数:
0
h-index:
0
FROMHOLD, AT
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1963,
24
(09)
: 1081
-
+
[7]
SPACE CHARGE IN GROWING OXIDE FILMS
FROMHOLD, AT
论文数:
0
引用数:
0
h-index:
0
FROMHOLD, AT
[J].
JOURNAL OF CHEMICAL PHYSICS,
1963,
38
(01)
: 282
-
&
[8]
Jaffe G, 1933, ANN PHYS-BERLIN, V16, P217
[9]
STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
LOGAN, JS
论文数:
0
引用数:
0
h-index:
0
LOGAN, JS
BURKHARDT, PJ
论文数:
0
引用数:
0
h-index:
0
BURKHARDT, PJ
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(04)
: 376
-
&
[10]
EFFECT OF TEMPERATURE + BIAS ON GLASS-SILICON INTERFACES
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(04)
: 385
-
&
←
1
2
3
→
共 22 条
[1]
BASSOUS E, PRIVATE COMMUNICATIO
[2]
BRENNEMAN AE, PRIVATE COMMUNICATIO
[3]
DWIGHT HB, 1934, TABLES INTEGRALS OTH, P42
[4]
SOME EFFECTS OF MATERIAL PARAMETERS ON THE DESIGN OF SURFACE SPACE-CHARGE VARACTORS
FRANKL, DR
论文数:
0
引用数:
0
h-index:
0
FRANKL, DR
[J].
SOLID-STATE ELECTRONICS,
1961,
2
(01)
: 71
-
76
[5]
SPACE CHARGE IN GROWING OXIDE FILMS .3. MULTISPECIES DIFFUSION
FROMHOLD, AT
论文数:
0
引用数:
0
h-index:
0
FROMHOLD, AT
[J].
JOURNAL OF CHEMICAL PHYSICS,
1963,
39
(09)
: 2278
-
+
[6]
KINETICS OF OXIDE FILM GROWTH ON METAL CRYSTALS .1. FORMULATION AND NUMERICAL SOLUTIONS
FROMHOLD, AT
论文数:
0
引用数:
0
h-index:
0
FROMHOLD, AT
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1963,
24
(09)
: 1081
-
+
[7]
SPACE CHARGE IN GROWING OXIDE FILMS
FROMHOLD, AT
论文数:
0
引用数:
0
h-index:
0
FROMHOLD, AT
[J].
JOURNAL OF CHEMICAL PHYSICS,
1963,
38
(01)
: 282
-
&
[8]
Jaffe G, 1933, ANN PHYS-BERLIN, V16, P217
[9]
STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
LOGAN, JS
论文数:
0
引用数:
0
h-index:
0
LOGAN, JS
BURKHARDT, PJ
论文数:
0
引用数:
0
h-index:
0
BURKHARDT, PJ
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(04)
: 376
-
&
[10]
EFFECT OF TEMPERATURE + BIAS ON GLASS-SILICON INTERFACES
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(04)
: 385
-
&
←
1
2
3
→