ANALYSIS OF STRESS-DISTRIBUTION IN SEMICONDUCTOR SUBSTRATES WITH FILM EDGES

[1] HU SM, 1979, J APPL PHYS, V50, P4661, DOI 10.1063/1.326575

[2] FILM-EDGE-INDUCED STRESS IN SILICON SUBSTRATES [J]. APPLIED PHYSICS LETTERS, 1978, 32 (01) : 5 - 7

[3] METHOD FOR FINDING CRITICAL STRESSES OF DISLOCATION MOVEMENT [J]. APPLIED PHYSICS LETTERS, 1977, 31 (03) : 139 - 141

[4] STRESS DISTRIBUTIONS IN SILICON CRYSTAL SUBSTRATES WITH THIN-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 2782 - 2791

[5] Timoshenko S., 1951, THEORY ELASTICITY

[6] VANNIE AG, 1980, SOLID STATE TECHNOL, V23, P81

[1] HU SM, 1979, J APPL PHYS, V50, P4661, DOI 10.1063/1.326575

[2] FILM-EDGE-INDUCED STRESS IN SILICON SUBSTRATES [J]. APPLIED PHYSICS LETTERS, 1978, 32 (01) : 5 - 7

[3] METHOD FOR FINDING CRITICAL STRESSES OF DISLOCATION MOVEMENT [J]. APPLIED PHYSICS LETTERS, 1977, 31 (03) : 139 - 141

[4] STRESS DISTRIBUTIONS IN SILICON CRYSTAL SUBSTRATES WITH THIN-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 2782 - 2791

[5] Timoshenko S., 1951, THEORY ELASTICITY

[6] VANNIE AG, 1980, SOLID STATE TECHNOL, V23, P81