ENHANCED DIFFERENTIAL MAGNETORESISTANCE OF CU/CO(100) MULTILAYERS

被引:6
作者
GIRON, F [1 ]
BOHER, P [1 ]
HOUDY, P [1 ]
PIERRE, F [1 ]
BEAUVILLAIN, P [1 ]
CHAPPERT, C [1 ]
LEDANG, K [1 ]
VEILLET, P [1 ]
机构
[1] UNIV PARIS 11,INST ELECTR FONDAMENTALE,CNRS,URA 022,F-91405 ORSAY,FRANCE
关键词
D O I
10.1016/0304-8853(92)91590-P
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on structural and magnetic studies of diode rf-sputtered fcc Cu/Co (100) multilayers. All samples exhibit a nearly monocrystalline periodic structure with roughness of about 6 angstrom. We observe oscillations of magnetoresistance as the Cu layer thickness is varied. The maximum of magnetoresistance is found for t(Cu) = 18.5 angstrom (up to DELTA-R/R congruent-to 6%), and a differential magnetoresistance as high as DELTA-R/R DELTA-H congruent-to 1.4 kOe-1 is obtained. An appropriate combination of antiferromagnetic coupling and quadratic in-plane anisotropy is responsible of this enhancement.
引用
收藏
页码:1887 / 1888
页数:2
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