X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF TITANIUM NITRIDE BARRIER METALS PREPARED BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION

被引：6

作者：

CHANG, YH ^{[1
]}

WON, SJ ^{[1
]}

OH, JE ^{[1
]}

PAEK, SH ^{[1
]}

LEE, HD ^{[1
]}

CHOI, JS ^{[1
]}

LEE, SI ^{[1
]}

AHN, ST ^{[1
]}

LEE, JG ^{[1
]}

机构：

[1] HAN YANG UNIV,DEPT MAT ENGN,SEOUL,SOUTH KOREA

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1995年 / 34卷 / 7B期

关键词：

TITANIUM NITRIDE; BARRIER METALS; XPS; CARBON IMPURITY;

D O I：

10.1143/JJAP.34.L907

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Titanium nitride (TiN) films prepared by means of low-pressure metalorganic chemical vapor deposition (LP-MOCVD) with the tetrakis-dimethyl-amino titanium (TDMAT) and ammonia, attempting for producing conformal barrier metals for ultra-large scale integrated devices, are studied by means of X-ray photoelectron spectroscopy (XPS) in conjunction with Ar ion bombardment. In the detailed analysis of XPS spectra of the C 1 s region composed of two peaks corresponding to the chemical bondings of hydrocarbon and Ti-C, it is found that the relative intensity ratio between two peaks can be a direct measure of film properties, and that the chemical bonding of hydrocarbon dominates as the film thickness increases and the deposition temperature decreases.

引用

页码：L907 / L910

页数：4

共 12 条

[1] KINETIC ASPECTS OF THE LPCVD OF TITANIUM NITRIDE FROM TITANIUM TETRACHLORIDE AND AMMONIA [J].