CHEMICAL-SHIFTS OF SI-H STRETCHING FREQUENCIES AT SI(100) SURFACES PRE-EXPOSED TO OXYGEN IN THE SUBMONOLAYER RANGE

被引：84

作者：

SCHAEFER, JA

FRANKEL, D

STUCKI, F

GOPEL, W

LAPEYRE, GJ

机构：

来源：

SURFACE SCIENCE | 1984年 / 139卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(84)90050-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：L209 / L218

页数：10

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