SUBTHRESHOLD BEHAVIOR OF SILICON MOSFETS AT 4.2-K

被引:36
作者
KAMGAR, A
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D O I
10.1016/0038-1101(82)90052-1
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:537 / 539
页数:3
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[5]   DISCREPANCIES BETWEEN ABSORPTION AND PHOTOCONDUCTIVITY MEASUREMENTS IN SILICON INVERSION LAYERS [J].
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