LINEAR THERMAL-EXPANSION MEASUREMENTS ON SILICON FROM 6 TO 340 K

被引：284

作者：

LYON, KG

SALINGER, GL

SWENSON, CA

WHITE, GK

机构：

[1] IOWA STATE UNIV,AMES LAB,ENERGY RES & DEV ADM,AMES,IA 50011

[2] IOWA STATE UNIV,DEPT PHYS,AMES,IA 50011

[3] CSIRO,SYDNEY 2008,NEW S WALES,AUSTRALIA

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 03期

关键词：

D O I：

10.1063/1.323747

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：865 / 868

页数：4

共 12 条

[1] LATTICE CONSTANTS + THERMAL EXPANSIVITIES OF SILICON + OF CALCIUM FLUORIDE BETWEEN 6 DEGREES + 322 DEGREES K
BATCHELDER, DN
SIMMONS, RO
[J]. JOURNAL OF CHEMICAL PHYSICS, 1964, 41 (08) : 2324 - &
[2] EXPERIMENTAL DETERMINATION OF LOW-TEMPERATURE GRUNEISEN PARAMETER OF SILICON FROM PRESSURE DERIVATIVES OF ELASTIC CONSTANTS
BEATTIE, AG
SCHIRBER, JE
[J]. PHYSICAL REVIEW B, 1970, 1 (04): : 1548 - &
[3] THERMAL EXPANSION OF GERMANIUM AND SILICON AT LOW TEMPERATURES
CARR, RH
MCCAMMON, RD
WHITE, GK
[J]. PHILOSOPHICAL MAGAZINE, 1965, 12 (115) : 157 - +
[4] THERMAL EXPANSION OF SILICON AND ZINE OXIDE (I)
IBACH, H
[J]. PHYSICA STATUS SOLIDI, 1969, 31 (02): : 625 - +
[5] ABSOLUTE LINEAR THERMAL-EXPANSION MEASUREMENTS ON COPPER AND ALUMINUM FROM 5 TO 320 K
KROEGER, FR
SWENSON, CA
[J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) : 853 - 864
[6] LYON K, UNPUBLISHED
[7] PRECISE MEASUREMENT OF THERMAL-EXPANSION OF SILICON NEAR 40DEGREESC
NORTON, MA
BERTHOLD, JW
JACOBS, SF
PLUMMER, WA
[J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) : 1683 - 1685
[8] LOW-TEMPERATURE THERMAL-EXPANSION AND GRUNEISEN PARAMETERS OF SOME TETRAHEDRALLY BONDED SOLIDS
SMITH, TF
WHITE, GK
[J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1975, 8 (13): : 2031 - 2042
[9] THERMAL EXPANSIONS FRON 2 TO 40 DEGREES K OF GE SI AND 4 3-5 COMPOUNDS
SPARKS, PW
SWENSON, CA
[J]. PHYSICAL REVIEW, 1967, 163 (03): : 779 - &
[10] Thermal Expansion of Copper, Silver, and Gold at Low Temperatures
White, G. K.
Collins, J. G.
[J]. JOURNAL OF LOW TEMPERATURE PHYSICS, 1972, 7 (1-2) : 43 - 75

← 1 2 →