XPS STUDY OF THE A-C-H/AL2O3 INTERFACE

被引:16
作者
ERNST, KH [1 ]
PATSCHEIDER, J [1 ]
HAUERT, R [1 ]
TOBLER, M [1 ]
机构
[1] BERNA AG,CH-4600 OLTEN,SWITZERLAND
关键词
D O I
10.1002/sia.740210105
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The interface between diamond-like amorphous hydrogenated carbon (a-C:H) and Al2O3 was analysed by sputter depth profile analysis via x-ray photoelectron spectroscopy. X-ray photoelectron spectra were also recorded during direct ion beam deposition (CH4, E = 400 eV) monitoring the initial build-up of the interface. No stoichiometric interface compound was detected, although Al2O3 is reduced to Al2O3-x (x similar to 0.5-1) enabling an interaction with the carbon atoms. This results in an excellent adhesion of a-C:H to the chemically inert Al2O3.
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页码:32 / 37
页数:6
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