RAMAN-STUDY OF THERMALLY ANNEALED SILICON SMALL PARTICLES AND THIN-FILMS

被引:9
作者
OKADA, T [1 ]
IWAKI, T [1 ]
KASAHARA, H [1 ]
YAMAMOTO, K [1 ]
机构
[1] KOBE UNIV,FAC ENGN,DEPT ELECTR ENGN,KOBE 657,JAPAN
关键词
D O I
10.1016/0038-1098(84)90846-9
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
15
引用
收藏
页码:363 / 366
页数:4
相关论文
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