VALIDITY OF THE KINEMATICAL APPROXIMATION IN TRANSMISSION ELECTRON-DIFFRACTION FOR THE ANALYSIS OF SURFACE-STRUCTURES

被引：25

作者：

TANISHIRO, Y ^{[1
]}

TAKAYANAGI, K ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,MIDORI KU,TOKYO 152,JAPAN

来源：

ULTRAMICROSCOPY | 1989年 / 27卷 / 01期

关键词：

D O I：

10.1016/0304-3991(89)90196-4

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：1 / 8

页数：8

共 11 条

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[3] KINEMATIC LOW-ENERGY ELECTRON-DIFFRACTION INTENSITIES FROM AVERAGED DATA - METHOD FOR SURFACE CRYSTALLOGRAPHY
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[4] DIRECT OBSERVATION OF THE PHASE-TRANSITION BETWEEN THE (7X7) AND (1X1) STRUCTURES OF CLEAN (111) SILICON SURFACES
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[J]. SURFACE SCIENCE, 1981, 109 (02) : 353 - 366
[5] HIGH-ENERGY TRANSMISSION ELECTRON-DIFFRACTION AND IMAGING STUDIES OF THE SILICON(111) 7X7 SURFACE-STRUCTURE
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[J]. ULTRAMICROSCOPY, 1983, 11 (2-3) : 117 - 124
[6] STRUCTURAL-ANALYSIS OF SI(111)-7X7 BY UHV-TRANSMISSION ELECTRON-DIFFRACTION AND MICROSCOPY
TAKAYANAGI, K
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 1502 - 1506
[7] STRUCTURE-ANALYSIS OF SI(111)-7X7 RECONSTRUCTED SURFACE BY TRANSMISSION ELECTRON-DIFFRACTION
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TAKAHASHI, M
[J]. SURFACE SCIENCE, 1985, 164 (2-3) : 367 - 392
[8] TAKAYANAGI K, 1987, P ASIA PACIFIC S SUR, P23
[9] TANISHIRO Y, 1986, J MICROSC-OXFORD, V142, P211, DOI 10.1111/j.1365-2818.1986.tb02758.x
[10] TANISHIRO Y, 1986, 11TH P C EL MICR KYO, P1339

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