IMPLANTATION PROFILES OF LOW-ENERGY HELIUM IN NIOBIUM AND BLISTERING MECHANISM

被引：102

作者：

BEHRISCH, R ^{[1
]}

BOTTIGER, J ^{[1
]}

ECKSTEIN, W ^{[1
]}

LITTMARK, U ^{[1
]}

ROTH, J ^{[1
]}

SCHERZER, BMU ^{[1
]}

机构：

[1] MAX PLANCK INST PLASMA PHYS,EURATOM ASSOC,D-8046 GARCHING,FED REP GER

来源：

APPLIED PHYSICS LETTERS | 1975年 / 27卷 / 04期

关键词：

D O I：

10.1063/1.88427

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：199 / 201

页数：3

共 23 条

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[8] PLASMA CONTAMINATION AND WALL EROSION IN THERMONUCLEAR REACTORS [J].

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[9]

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[10]

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