DEEP-UV PHOTOLITHOGRAPHIC APPLICATIONS OF CO-POLYMER (METHACRYLONITRILE METHACRYLIC-ACID)

被引：6

作者：

HIRAOKA, H

WELSH, WL

BARGON, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582677

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1062 / 1065

页数：4

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