A SENSITIVE NOVOLAC-BASED POSITIVE ELECTRON RESIST

被引：71

作者：

BOWDEN, MJ

THOMPSON, LF

FAHRENHOLTZ, SR

DOERRIES, EM

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 06期

关键词：

D O I：

10.1149/1.2127625

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1304 / 1313

页数：10

共 21 条

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THOMPSON, LF .

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[9]

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[10] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION [J].

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