STABILITY AND ELECTRONIC-PROPERTIES OF COMPLEX STRUCTURES OF SILICON AND CARBON UNDER PRESSURE - DENSITY-FUNCTIONAL CALCULATIONS

被引：91

作者：

BISWAS, R

MARTIN, RM

NEEDS, RJ

NIELSEN, OH

机构：

[1] XEROX CORP, PALO ALTO RES CTR, PALO ALTO, CA 94304 USA

[2] UNIV CAMBRIDGE, CAVENDISH LAB, CAMBRIDGE CB3 0HE, ENGLAND

[3] NORDITA, DK-2100 COPENHAGEN, DENMARK

来源：

PHYSICAL REVIEW B | 1987年 / 35卷 / 18期

关键词：

D O I：

10.1103/PhysRevB.35.9559

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：9559 / 9568

页数：10

相关论文

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