INSTRUMENTATION FOR SURFACE STUDIES - XPS ANGULAR-DISTRIBUTIONS

被引：134

作者：

FADLEY, CS ^{[1
]}

机构：

[1] UNIV HAWAII,DEPT CHEM,HONOLULU,HI 96822

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1974年 / 5卷 / NOV-D期

关键词：

D O I：

10.1016/0368-2048(74)85048-6

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：725 / 754

页数：30

共 17 条

[1]

BRUNNER JH, PRIVATE COMMUNICATIO

[2] ANGULAR DISTRIBUTION OF PHOTOELECTRONS FROM A METAL SINGLE CRYSTAL [J].

FADLEY, CS ;

BERGSTROM, SA .

PHYSICS LETTERS A, 1971, A 35 (05) :375-+

[3]

FADLEY CS, 1970, UCRL19535 LAWR BERK

[4]

FADLEY CS, 1970, THESIS U CALIFORNIA

[5]

FADLEY CS, IN PRESS

[6]

FADLEY CS, TO BE PUBLISHED

[7] SURFACE SENSITIVITY AND ANGULAR DEPENDENCE OF X-RAY PHOTOELECTRON SPECTRA [J].

FRASER, WA ;

FLORIO, JV ;

DELGASS, WN ;

ROBERTSON, WD .

SURFACE SCIENCE, 1973, 36 (02) :661-674

[8] ANGULAR DEPENDENCES IN ELECTRON-EXCITED AUGER EMISSION [J].

HARRIS, LA .

SURFACE SCIENCE, 1969, 15 (01) :77-&

[9]

Hedman J., 1972, PHYS SCRIPTA, V5, P93, DOI [10.1088/0031-8949/5/1-2/015, DOI 10.1088/0031-8949/5/1-2/015]

[10] ENHANCEMENT OF SENSITIVITY IN ESCA SPECTROMETERS [J].

HELMER, JC ;

WEICHERT, NH .

APPLIED PHYSICS LETTERS, 1968, 13 (08) :266-&

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