EXCIMER LASER RECRYSTALLIZATION OF AMORPHOUS SI FILMS CHARACTERIZED BY GRAZING X-RAY-DIFFRACTION AND OPTICAL REFLECTIVITY

被引：11

作者：

MATHE, EL ^{[1
]}

MAILLOU, JG ^{[1
]}

NAUDON, A ^{[1
]}

FOGARASSY, E ^{[1
]}

ELLIQ, M ^{[1
]}

DEUNAMUNO, S ^{[1
]}

机构：

[1] CTR RECH NUCL,PHASE LAB,CNRS,UPR 292,IN2P3,F-67037 STRASBOURG,FRANCE

来源：

APPLIED SURFACE SCIENCE | 1989年 / 43卷

关键词：

D O I：

10.1016/0169-4332(89)90203-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：142 / 149

页数：8

共 8 条

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[2]

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[3] A THERMAL DESCRIPTION OF THE MELTING OF C-SILICON AND A-SILICON UNDER PULSED EXCIMER LASERS [J].

DEUNAMUNO, S ;

FOGARASSY, E .

APPLIED SURFACE SCIENCE, 1989, 36 (1-4) :1-11

[4] MELTING THRESHOLD OF CRYSTALLINE AND AMORPHIZED SI IRRADIATED WITH A PULSED ARF (193 NM) EXCIMER LASER [J].

FOULON, F ;

FOGARASSY, E ;

SLAOUI, A ;

FUCHS, C ;

UNAMUNO, S ;

SIFFERT, P .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04) :361-364

[5]

MAILLOU JG, 1989, APPL SURF SCI, V43, P142

[6]

NAUDON A, 1987, EUROPEAN MAT RES SOC, V15, P309

[7]

NEVOT L, 1978, THESIS ORSAY

[8] STUDY OF THE CORRELATION BETWEEN HARDNESS AND STRUCTURE OF NITROGEN-IMPLANTED TITANIUM SURFACES [J].

PIVIN, JC ;

PONS, F ;

TAKADOUM, J ;

POLLOCK, HM ;

FARGES, G .

JOURNAL OF MATERIALS SCIENCE, 1987, 22 (03) :1087-1096

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