THE MORPHOLOGY AND STRUCTURE OF CHEMICALLY VAPOR-DEPOSITED TI(C,N) COATINGS

被引:39
作者
CHENG, DJ
SUN, WP
HON, MH
机构
[1] Natl Cheng Kung Univ, Tainan, Taiwan, Natl Cheng Kung Univ, Tainan, Taiwan
关键词
D O I
10.1016/0040-6090(87)90338-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
TITANIUM CARBIDE
引用
收藏
页码:45 / 53
页数:9
相关论文
共 20 条
[1]   THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIC, TIN AND TICXN1-X [J].
ARCHER, NJ .
THIN SOLID FILMS, 1981, 80 (1-3) :221-225
[2]  
BIRKS LS, 1971, ELECTRON PROBE MICRO
[3]  
Buerger MJ., 1978, ELEMENTARY CRYSTALLO
[5]   STUDY OF GROWTH-RATE AND FAILURE MODE OF CHEMICALLY VAPOR-DEPOSITED TIN, TICXNY AND TIC ON CEMENTED TUNGSTEN CARBIDE [J].
CHO, JS ;
NAM, SW ;
CHUN, JS .
JOURNAL OF MATERIALS SCIENCE, 1982, 17 (09) :2495-2502
[6]   MORPHOLOGY AND STRUCTURE OF ION-PLATED TIN, TIC AND TI(C,N) COATINGS [J].
GABRIEL, HM ;
KLOOS, KH .
THIN SOLID FILMS, 1984, 118 (03) :243-254
[7]   A POSSIBLE GROWTH-MECHANISM OF AN ICOSAHEDRAL PHASE [J].
HILLERT, M ;
AGREN, J .
ACTA METALLURGICA, 1985, 33 (09) :1621-1624
[8]   EFFECTS OF THE EXPERIMENTAL PARAMETERS ON THE PREFERRED ORIENTATION OF CHEMICALLY VAPOR-DEPOSITED TIC ON CEMENTED CARBIDES [J].
LEE, CW ;
NAM, SW ;
CHUN, JS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01) :42-46
[9]   CHEMICAL VAPOR-DEPOSITION OF A TIC COATING ON A CEMENTED-CARBIDE CUTTING TOOL [J].
LEE, M ;
RICHMAN, MH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (07) :993-996
[10]  
PEARSON WB, 1972, CRYSTAL CHEM PHYSICS